Products > Fab Processes > IBM
IBM Fabrication
Technology descriptions, MPW fabrication schedule, and vendor document access procedures for the IBM fabrication processes available through MOSIS.
IBM Fabrication Processes
The IBM fabrication processes available through MOSIS range from 32 nanometer to 0.25 µm in CMOS, and from 0.13 µm to 0.50 µm in SiGe BiCMOS.
IBM Multi-Project Wafer (MPW) Run Processes
These processes are available for Multi-Project Wafer (MPW) Runs or Dedicated (COT) Runs.
IBM Dedicated Run (COT) Processes
These processes are available for Dedicated (COT) runs.
IBM Trusted Foundry Run Processes
These processes are available for Dedicated (COT) or DoD/Trusted Foundry runs.
IBM Fabrication Schedule
MOSIS offers a multiproject wafer (MPW) run schedule through IBM. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
IBM Design Kits: CMOS | SiGe
IBM design kits are available upon approval for MOSIS customers.
How to Access IBM Documents
General instructions for accessing IBM design rules and cell libraries through MOSIS.
International Traffic in Arms Regulations (ITAR)
All IBM processes offered through MOSIS support designs subject to export control under ITAR regulations.