Products > Fab Processes > IBM
Technology descriptions, MPW fabrication schedule, and vendor document access procedures for the IBM fabrication processes available through MOSIS.
IBM Fabrication Processes
The IBM fabrication processes available through MOSIS range from 32 nanometer to 0.25 µm in CMOS, and from 0.13 µm to 0.50 µm in SiGe BiCMOS.
These processes are available for Multi-Project Wafer (MPW) Runs or Dedicated (COT) Runs.
These processes are available for Dedicated (COT) runs.
These processes are available for Dedicated (COT) or DoD/Trusted Foundry runs.
MOSIS offers a multiproject wafer (MPW) run schedule through IBM. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
IBM design kits are available upon approval for MOSIS customers.
General instructions for accessing IBM design rules and cell libraries through MOSIS.
All IBM processes offered through MOSIS support designs subject to export control under ITAR regulations.